MATERIAL COMPRISING A STACK WITH A THIN ZINC-BASED OXIDE DIELECTRIC SUBLAYER AND METHOD FOR DEPOSITING SAID MATERIAL

The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and comprising: - an underlayer of zinc-based oxide, ZnO (129), between 0.3 and 4.4 nm thick; - a dielectric underlayer of sil...

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Bibliographische Detailangaben
Hauptverfasser: GUIMARD, Denis, ORVEN, Matthieu, BARRES, Thomas
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:The invention relates to a material comprising a substrate (30) coated on one face (29) with a stack of thin layers (14) comprising at least one metal functional layer (140) and comprising: - an underlayer of zinc-based oxide, ZnO (129), between 0.3 and 4.4 nm thick; - a dielectric underlayer of silicon-based nitride, Si3N4 (127), between 10.0 and 50.0 nm thick; - an overlayer of zinc-based oxide, ZnO (161), between 2.0 and 10.0 nm thick; - a dielectric overlayer (165); - a capping layer of titanium-based oxide, TiOx (150), located on and in contact with said functional layer (140).