EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

An extreme ultraviolet light source apparatus includes a light source part configured to generate a plasma that emits extreme ultraviolet light; a first vacuum housing in which the light source part is located; a second vacuum housing arranged between the first vacuum housing and a utilizing apparat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	YABUTA Hironobu, KIKUIRI Hajime
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	An extreme ultraviolet light source apparatus includes a light source part configured to generate a plasma that emits extreme ultraviolet light; a first vacuum housing in which the light source part is located; a second vacuum housing arranged between the first vacuum housing and a utilizing apparatus in which the extreme ultraviolet light is utilized, the second vacuum housing communicating with the utilizing apparatus and the first vacuum housing; and a debris trap located inside the second vacuum housing and configured to deflect traveling directions of debris particles emitted from the plasma toward the utilizing apparatus. Between the first vacuum housing and the second vacuum housing, there is provided a window through which the extreme ultraviolet light emitted from the light source part passes from the first vacuum housing to the second vacuum housing. A wall of the second vacuum housing has a through-hole and a window that is configured to allow the extreme ultraviolet light to pass from the second vacuum housing to the utilizing apparatus.