ALUMINUM-SCANDIUM COMPOSITE AND METHOD OF MAKING

An Al-Sc alloy sputtering target. The target comprising from 1.0 at% to 65 at% scandium and from 35 at% to 99 at% aluminum and having a microstructure including a first aluminum matrix phase and a second phase dispersed uniformly therethrough. The second phase comprises one or more compounds corresp...

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Bibliographische Detailangaben
Hauptverfasser:	VAN HEERDEN, David Peter, GARDINIER, Katharine S, BAILEY, Robert S
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	An Al-Sc alloy sputtering target. The target comprising from 1.0 at% to 65 at% scandium and from 35 at% to 99 at% aluminum and having a microstructure including a first aluminum matrix phase and a second phase dispersed uniformly therethrough. The second phase comprises one or more compounds corresponding to the formula ScxAly, where x is from 1 to 2 and y is from 0 to 3.