METHOD FOR MAINTAINING A PROJECTION EXPOSURE APPARATUS, SERVICE MODULE AND ARRANGEMENT FOR SEMICONDUCTOR LITHOGRAPHY

A method for maintaining a projection exposure apparatus comprising at least two modules and a reference element, wherein the modules are referenced to the reference element, comprises: removing a module; attaching a service module to or in the vicinity of the projection exposure apparatus; referenc...

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Bibliographische Detailangaben
Hauptverfasser: EHM, Dirk, KUGLER, Jens, NEFZI, Marwene, MODESTE, Benjahman, Julius
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A method for maintaining a projection exposure apparatus comprising at least two modules and a reference element, wherein the modules are referenced to the reference element, comprises: removing a module; attaching a service module to or in the vicinity of the projection exposure apparatus; referencing the service module to the reference element of the projection exposure apparatus; and implementing a maintenance measure with the aid of the service module.