METHOD FOR MAINTAINING A PROJECTION EXPOSURE APPARATUS, SERVICE MODULE AND ARRANGEMENT FOR SEMICONDUCTOR LITHOGRAPHY
A method for maintaining a projection exposure apparatus comprising at least two modules and a reference element, wherein the modules are referenced to the reference element, comprises: removing a module; attaching a service module to or in the vicinity of the projection exposure apparatus; referenc...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A method for maintaining a projection exposure apparatus comprising at least two modules and a reference element, wherein the modules are referenced to the reference element, comprises: removing a module; attaching a service module to or in the vicinity of the projection exposure apparatus; referencing the service module to the reference element of the projection exposure apparatus; and implementing a maintenance measure with the aid of the service module. |
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