MISREGISTRATION METROLOGY BY USING FRINGE MOIRÉ AND OPTICAL MOIRÉ EFFECTS

MISREGISTRATION METROLOGY BY USING FRINGE MOIRÉ AND OPTICAL MOIRÉ EFFECTS

A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two workin...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: GHINOVKER, Mark, FELER, Yoel, GUREVICH, Evgeni, SVIZHER, Alexander, LEVINSKI, Vladimir
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
TESTING
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Beschreibung
Zusammenfassung:A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two working zones along a measurement direction based on the image, and calculate an overlay between the two sample layers by dividing the apparent overlay by a Moiré gain to compensate for Moiré interference.