PROCESS FOR MANUFACTURING A LOW-NOISE PHOTODETECTOR DEVICE IN A CDHGTE SUBSTRATE

A method for manufacturing a photodetection device, which includes the following steps:making a cadmium-rich structured coating, over a substrate of CdxHg1-xTe, and using a first etching mask; etching to enlarge the through openings of the first etching mask or the through openings of an interlayer...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CHAMONAL, Jean-Paul, ROCHETTE, Florent, BOULARD, François, LOBRE, Clément
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A method for manufacturing a photodetection device, which includes the following steps:making a cadmium-rich structured coating, over a substrate of CdxHg1-xTe, and using a first etching mask; etching to enlarge the through openings of the first etching mask or the through openings of an interlayer etched with the structured coating, so as to form a second etching mask; injecting acceptor doping elements into the substrate, throughout the second etching mask, and activating and diffusing the acceptor doping elements to form at least one P doped region in the semiconductor substrate; selective interdiffusion annealing of cadmium, so as to form in each P doped region a cadmium-rich concentrated well with a cadmium concentration lateral gradient; and making at least one electrical contact pad, at each through opening in the structured coating.