SILICON CARBIDE JUNCTION FIELD EFFECT TRANSISTORS
Silicon carbide (SiC) junction field effect transistors (JFETs) are presented herein. A deep implant (e.g., a deep p-type implant) forms a JFET gate (106). MET gate and MET source (108) may be implemented with heavily doped n-type (N+) and heavily doped p-type (P+) implants, respectively. Terminatio...
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Zusammenfassung: | Silicon carbide (SiC) junction field effect transistors (JFETs) are presented herein. A deep implant (e.g., a deep p-type implant) forms a JFET gate (106). MET gate and MET source (108) may be implemented with heavily doped n-type (N+) and heavily doped p-type (P+) implants, respectively. Termination regions may be implemented by using equipotential rings formed by deep implants (e.g., deep p-type implants). |
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