DEVICE FOR DETECTING A TEMPERATURE, SYSTEM FOR PRODUCING AN OPTICAL ELEMENT, AND METHOD FOR PRODUCING AN OPTICAL ELEMENT

A device (20) for detecting a temperature on a surface (15) of an optical element (14) for semiconductor lithography. The device includesan optical element (14) having a face (16) irradiated with electromagnetic radiation (7, 8, 43),a temperature recording device (21), anda temperature controlled el...

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Bibliographische Detailangaben
Hauptverfasser:	LAUFER, Timo, STOLZ, Michael
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLORIMETRY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY TESTING
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Beschreibung
Zusammenfassung:	A device (20) for detecting a temperature on a surface (15) of an optical element (14) for semiconductor lithography. The device includesan optical element (14) having a face (16) irradiated with electromagnetic radiation (7, 8, 43),a temperature recording device (21), anda temperature controlled element (22) configured to be temperature-controlled and arranged so that the predominant proportion of the intensity of the thermal radiation (25.2) detected by the temperature recording device and reflected by reflection at the surface of the optical element is emitted by the temperature-controlled element.Also disclosed are an installation (1) for producing a surface (15) of an optical element (14) for semiconductor lithography and a method for producing a surface (15) of an optical element (14) of a projection exposure apparatus (30), wherein the surface is temperature-controlled and the surface temperature is detected during the temperature control.