PHOTOCURABLE RESIN COMPOSITION FOR IMPRINT MOLDING, RESIN MOLD, METHOD FOR FORMING PATTERN USING SAID RESIN MOLD, COMPOSITE MATERIAL HAVING SAID RESIN MOLD, METHOD FOR PRODUCING SAID COMPOSITE MATERIAL, AND METHOD FOR PRODUCING OPTICAL MEMBER
A photocurable resin composition for an imprint mold includes: a component (a): at least one of a fluorinated (meth)acrylate monomer having at least one (meth)acryloyloxy group and a dialkylsiloxane-based (meth)acrylate monomer having at least one (meth)acryloyloxy group; and a component (b): an acy...
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| creator | KATO, Fuminobu OSAKI, Takeshi TANAKA, Risa |
| description | A photocurable resin composition for an imprint mold includes: a component (a): at least one of a fluorinated (meth)acrylate monomer having at least one (meth)acryloyloxy group and a dialkylsiloxane-based (meth)acrylate monomer having at least one (meth)acryloyloxy group; and a component (b): an acyclic bifunctional (meth)acrylate monomer having two (meth)acryloyloxy groups represented by the following formula (1), wherein a compounding ratio between the component (a) and the component (b) is 1 to 97 : 99 to 3 in terms of mass ratio, and the component (b) has a molecular weight of 700 or less. |
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and a component (b): an acyclic bifunctional (meth)acrylate monomer having two (meth)acryloyloxy groups represented by the following formula (1), wherein a compounding ratio between the component (a) and the component (b) is 1 to 97 : 99 to 3 in terms of mass ratio, and the component (b) has a molecular weight of 700 or less.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
| title | PHOTOCURABLE RESIN COMPOSITION FOR IMPRINT MOLDING, RESIN MOLD, METHOD FOR FORMING PATTERN USING SAID RESIN MOLD, COMPOSITE MATERIAL HAVING SAID RESIN MOLD, METHOD FOR PRODUCING SAID COMPOSITE MATERIAL, AND METHOD FOR PRODUCING OPTICAL MEMBER |
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