PHOTOCURABLE RESIN COMPOSITION FOR IMPRINT MOLDING, RESIN MOLD, METHOD FOR FORMING PATTERN USING SAID RESIN MOLD, COMPOSITE MATERIAL HAVING SAID RESIN MOLD, METHOD FOR PRODUCING SAID COMPOSITE MATERIAL, AND METHOD FOR PRODUCING OPTICAL MEMBER

A photocurable resin composition for an imprint mold includes: a component (a): at least one of a fluorinated (meth)acrylate monomer having at least one (meth)acryloyloxy group and a dialkylsiloxane-based (meth)acrylate monomer having at least one (meth)acryloyloxy group; and a component (b): an acy...

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Hauptverfasser: KATO, Fuminobu, OSAKI, Takeshi, TANAKA, Risa
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A photocurable resin composition for an imprint mold includes: a component (a): at least one of a fluorinated (meth)acrylate monomer having at least one (meth)acryloyloxy group and a dialkylsiloxane-based (meth)acrylate monomer having at least one (meth)acryloyloxy group; and a component (b): an acyclic bifunctional (meth)acrylate monomer having two (meth)acryloyloxy groups represented by the following formula (1), wherein a compounding ratio between the component (a) and the component (b) is 1 to 97 : 99 to 3 in terms of mass ratio, and the component (b) has a molecular weight of 700 or less.