RESIN COMPOSITION FOR STEREOLITHOGRAPHY
The present invention provides a resin composition for stereolithography that is easily shapable with good shape precision while reducing sedimentation of inorganic particles during storage, and a obtained three-dimensional shaped article thereby excels in mechanical characteristics such as flexural...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The present invention provides a resin composition for stereolithography that is easily shapable with good shape precision while reducing sedimentation of inorganic particles during storage, and a obtained three-dimensional shaped article thereby excels in mechanical characteristics such as flexural strength and flexural modulus, in addition to having a desirable shade and good shade stability. The present invention relates to a resin composition for stereolithography comprising a polymerizable monomer (a), a photopolymerization initiator (b), an inorganic particle (c) having an average particle diameter of 5 to 500 nm, and a hindered phenolic compound (d), wherein the content of the photopolymerization initiator (b) is 0.1 to 10 parts by mass relative to 100 parts by mass of the polymerizable monomer (a), the content of the inorganic particle (c) is 50 to 400 parts by mass relative to 100 parts by mass of the polymerizable monomer (a), and the content of the hindered phenolic compound (d) is 0.1 to 500 parts by mass relative to 100 parts by mass of the photopolymerization initiator (b). |
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