PROVIDING DIFFERENT PATTERNS ON A SINGLE SUBSTRATE

A method for providing different patterns on a single substrate, the method comprising executing at least twice a sequence of the following steps: depositing (120) a hardmask (230) on the layer of interest (220) and patterning the hardmask with a predefined pattern to create an accessible portion on...

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Bibliographische Detailangaben
Hauptverfasser:	PANERI, ABHILASH, SABUNCUOGLU TEZCAN, Deniz, SEEMA SASEENDRAN, Sandeep, CUMMINS, Cian
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for providing different patterns on a single substrate, the method comprising executing at least twice a sequence of the following steps: depositing (120) a hardmask (230) on the layer of interest (220) and patterning the hardmask with a predefined pattern to create an accessible portion on the layer of interest (220); spinning (130) a glass/carbon layer (240) on the hardmask (230) and on the accessible portion of the layer of interest (220); spin coating (140) a block copolymer (250) on the glass/carbon layer (240); transferring (150) a predefined block copolymer pattern onto the layer of interest (220) thereby obtaining a transferred pattern (260), removing (160) the hard mask; filling (170) the transferred pattern (260) followed by chemical mechanical polishing or etching back (180); wherein different block copolymer patterns are used.