IMPURITY PROCESSING DEVICE AND IMPURITY PROCESSING METHOD

An impurity processing device comprising piping that channels a metal-impurity-containing liquid subject to processing, a first electrode and a second electrode that are positioned in the piping, and a power supply unit for channeling a current between the first electrode and the second electrode.

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Bibliographische Detailangaben
Hauptverfasser: KUME Toshiro, OGAWA Yuko, NAKAI Miyuki
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:An impurity processing device comprising piping that channels a metal-impurity-containing liquid subject to processing, a first electrode and a second electrode that are positioned in the piping, and a power supply unit for channeling a current between the first electrode and the second electrode.