NOVEL FILTER MATERIAL, FACE MASK COMPRISING THE SAME AND METHOD OF MAKING THE SAME

The present invention provides a filter material comprising an antistatic substrate having a predefined antistatic capacity, and one or more layers of nanofibers applied on the substrate. The one or more layers of nanofibers may be fabricated to have gradient structure in various parameters includin...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: WONG, Siu Wah
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:The present invention provides a filter material comprising an antistatic substrate having a predefined antistatic capacity, and one or more layers of nanofibers applied on the substrate. The one or more layers of nanofibers may be fabricated to have gradient structure in various parameters including thickness of nanofiber layer, nanofiber pore size, nanofiber diameter, nanofiber content and the like to suit different filtration applications. The present invention also provides a face mask comprising the filter material and a method for making the filter material.