SYSTEM AND METHOD TO ENSURE PARAMETER MEASUREMENT MATCHING ACROSS METROLOGY TOOLS

Methods and systems for determining a model configured to predict values of physical characteristics (e.g., overlay, CD) associated with a patterned substrate measured using different measurement tools. The method involves obtaining a first set of measured data for a first patterned substrates using...

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Bibliographische Detailangaben
Hauptverfasser:	BOTTEGAL, Giulio, CAO, Xingang
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Zusammenfassung:	Methods and systems for determining a model configured to predict values of physical characteristics (e.g., overlay, CD) associated with a patterned substrate measured using different measurement tools. The method involves obtaining a first set of measured data for a first patterned substrates using a first measurement tool, and reference measurements of a physical characteristic. Also, a second set of measured data and virtual data for a second set of patterned substrates measured using a second set of measurement tools is obtained. A set of mapping functions between the second set of measured data and the virtual data are generated. The set of mapping functions is used to the first set of measured data. Then, a model is determined based on the reference measurements and the converted data such that the model predicts values of the physical characteristic that are within an acceptable threshold of the reference measurements.