UNIFORMITY CONTROL FOR RADIO FREQUENCY PLASMA PROCESSING SYSTEMS

UNIFORMITY CONTROL FOR RADIO FREQUENCY PLASMA PROCESSING SYSTEMS

A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.

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Bibliographische Detailangaben
Hauptverfasser: DE CHAMBRIER, Alexandre, SAVAS, Stephen E
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.