HIGH-PURITY TUNGSTEN(VI) OXYTETRACHLORIDE AND PROCESS FOR PREPARING SAME

A tungsten(VI) oxytetrachloride having a chemical purity of greater than 99.95%. The tungsten(VI) oxytetrachloride has a fraction of compounds selected from WCl6, WO2Cl2, WO3 and WO2, as defined as a ratio of a reflection having a highest intensity of one of WCl6, WO2Cl2, WO3 and WO2, (I(P2)100) in...

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Bibliographische Detailangaben
Hauptverfasser:	BRUMM, Holger, PASSING, Gerd, SCHNITTER, Christoph, KUPKA, Tomasz
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOSITIONS BASED THEREON COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F INORGANIC CHEMISTRY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR PREPARATION OR CHEMICAL WORKING-UP THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	A tungsten(VI) oxytetrachloride having a chemical purity of greater than 99.95%. The tungsten(VI) oxytetrachloride has a fraction of compounds selected from WCl6, WO2Cl2, WO3 and WO2, as defined as a ratio of a reflection having a highest intensity of one of WCl6, WO2Cl2, WO3 and WO2, (I(P2)100) in an x-ray diffraction pattern to a reflection having a highest intensity of the tungsten(VI) oxytetrachloride (I(WOCl4)100) in the x-ray diffraction pattern, expressed as I(P2)100/I(WOCl4)100, of less than 0.03.