METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPHIC PROCESS

Disclosed is a method of determining at least one stochastic metric relating to a lithographic process and associated optical metrology device. The method comprises obtaining a trained machine learning model, the machine learning model having been trained to infer one or more stochastic metric value...

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Bibliographische Detailangaben
Hauptverfasser:	PISARENCO, Maxim, MIDDLEBROOKS, Scott Anderson, RUTIGLIANI, Vito Daniele, BATISTAKIS, Chrysostomos, VAN KRAAIJ, Markus Gerardus Martinus Maria
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is a method of determining at least one stochastic metric relating to a lithographic process and associated optical metrology device. The method comprises obtaining a trained machine learning model, the machine learning model having been trained to infer one or more stochastic metric values for said stochastic metric from optical metrology data. Optical metrology data comprising at least one measurement signal relating to a structure having been exposed in a lithographic process is obtained and the trained machine learning model used to infer a value for said stochastic metric from said optical metrology data.