PELLICLE FILM, PELLICLE, ORIGINAL PLATE FOR EXPOSURE, EXPOSURE DEVICE, METHOD FOR PRODUCING PELLICLE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

Provided are a pellicle film, a pellicle, an original plate for exposure, an exposure device, a method of producing a semiconductor device, and a method of producing a pellicle, the pellicle film containing carbon nanotubes having a silicon carbide layer in which at least a part of carbon is substit...

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Bibliographische Detailangaben
Hauptverfasser:	DEGUCHI, Tomoe, FUJII, Yasuhisa, ONO, Yosuke, MATSUMOTO, Nobuko, OKUBO, Atsushi, ISHIKAWA, Hisako, YOSHIKAWA, Wataru, KOHMURA, Kazuo
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOUNDS THEREOF ELECTROGRAPHY HOLOGRAPHY INORGANIC CHEMISTRY MATERIALS THEREFOR METALLURGY NON-METALLIC ELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provided are a pellicle film, a pellicle, an original plate for exposure, an exposure device, a method of producing a semiconductor device, and a method of producing a pellicle, the pellicle film containing carbon nanotubes having a silicon carbide layer in which at least a part of carbon is substituted with silicon at least on a surface layer side.