MIRROR FOR PERFORMING METROLOGY IN A LASER BEAM SYSTEM, LASER BEAM SYSTEM, EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

A mirror for performing metrology of a laser beam system in an EUV light source is described, the mirror comprising:- a mirror layer having a front surface configured to receive and reflect a laser beam of the laser beam system;- a metrology layer arranged on a back surface of the mirror layer, the...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DER ZANDE, Willem, Joan, KUTLUER, Kutlu, VAN ZWOL, Adriaan, Roelof, MATHEW, John Philip
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY COLORIMETRY DEVICES USING STIMULATED EMISSION ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY TESTING X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	A mirror for performing metrology of a laser beam system in an EUV light source is described, the mirror comprising:- a mirror layer having a front surface configured to receive and reflect a laser beam of the laser beam system;- a metrology layer arranged on a back surface of the mirror layer, the metrology layer comprising a resistance grid comprising a plurality of electrically conducting segments and a plurality of electrical contacts configured to be connected to a metrology instrument.