TRANSPARENT SUBSTRATE PROVIDED WITH MULTILAYER FILM

The present invention pertains to a transparent substrate provided with a multilayer film, the transparent substrate being such that a multilayer film obtained by stacking a metal oxide layer and a silicon oxide layer in the stated order is provided to at least one main surface of a transparent subs...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KOBAYASHI Daisuke, NISHIKAWA Yasuhisa
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY MINERAL OR SLAG WOOL PERFORMING OPERATIONS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention pertains to a transparent substrate provided with a multilayer film, the transparent substrate being such that a multilayer film obtained by stacking a metal oxide layer and a silicon oxide layer in the stated order is provided to at least one main surface of a transparent substrate having two main surfaces, SiOx in at least one silicon oxide layer within the multilayer film satisfies the relationship 1.55 ≤ x < 2.00, the luminous transmittance of the multilayer film is 20-89%, and the resistance value is 104 Ω/□ or higher. The x in SiOx is a value derived by depth-direction compositional analysis in X-ray photoelectron spectroscopy (XPS) in which argon ion sputtering is used.