GAS INLET DEVICE FOR A CVD REACTOR

A gas distribution device has a plurality of gas inlet regions that are arranged above each other and can be adjusted by switching on or off respective valves. The gas inlet regions can also be adjusted by switching over one or more feed conduits through which process gases can be fed into respectiv...

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Bibliographische Detailangaben
1. Verfasser:	EICKELKAMP, Martin
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A gas distribution device has a plurality of gas inlet regions that are arranged above each other and can be adjusted by switching on or off respective valves. The gas inlet regions can also be adjusted by switching over one or more feed conduits through which process gases can be fed into respective gas distribution volumes of gas outlet zones. The respective gas distribution volumes are arranged above each other at several levels. Only one uniform process gas can exit into a process chamber through each of the gas inlet regions.