DETERGENT COMPOSITION FOR FOAMER

The present invention relates to a cleansing composition for a foamer, containing (A) an anionic surfactant, (B) a non-ionic surfactant having an HLB value of 7 to 11 and liquid at 25°C, (C) an amphoteric surfactant, (D) polyhydric alcohol, (E) oil, and (F) water, wherein a ratio of the content of c...

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1. Verfasser: IKEDA, Naoaki
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:The present invention relates to a cleansing composition for a foamer, containing (A) an anionic surfactant, (B) a non-ionic surfactant having an HLB value of 7 to 11 and liquid at 25°C, (C) an amphoteric surfactant, (D) polyhydric alcohol, (E) oil, and (F) water, wherein a ratio of the content of component (A) and the content of component (B) [(A)/(B)] (mass ratio) is 0.4 to 3.8, and a ratio of the content of component (B) and the content of component (E) [(B)/(E)] (mass ratio) is 0.4 to 6, the composition having a viscosity of not more than 500 mPa·s at 25°C and a pH of 3 to 6 at 25°C.According to the present invention, a cleansing composition for a foamer can be provided, which composition is superior in the cleansing off power on makeup cosmetics and foamability, and also superior in the discharge property from a foamer container. Furthermore, a cleansing composition for a foamer, permitting preferable use of an acyl acidic amino acid or a salt thereof as a surfactant can be provided.