STEREOLITHOGRAPHY APPARATUS AND RESIN RECEPTACLE
A bottom-up stereolithography apparatus (SLA) (150) comprises a support surface (152) and a vat assembly (100) comprises a first frame part (110) having a first upper surface (112) and a circumferential first inner side surface (113) defining a recess (114) within the first frame part. The apparatus...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A bottom-up stereolithography apparatus (SLA) (150) comprises a support surface (152) and a vat assembly (100) comprises a first frame part (110) having a first upper surface (112) and a circumferential first inner side surface (113) defining a recess (114) within the first frame part. The apparatus comprises an air channel (115) opening to the recess (114) through the first inner side surface (113). A receptacle (130) comprising a bowl is placeable in the vat assembly with the bowl in the recess so that, with the thereby formed vat (101) placed on the support surface (152), air can be evacuated from the recess (114) via the air channel (115) to stretch the bowl (131) against the support surface and the first inner side surface (113). |
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