X-RAY ANALYSIS APPARATUS

Provided is an X-ray analysis apparatus (100) including: a goniometer (104); a sample stage (2) provided at a rotation center (OG) of the goniometer (104); an X-ray source (F) configured to irradiate a sample (110) with an X-ray, the sample (110) being fixed on the sample stage (2); an X-ray detecto...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	OSAKABE, Takeshi
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	Provided is an X-ray analysis apparatus (100) including: a goniometer (104); a sample stage (2) provided at a rotation center (OG) of the goniometer (104); an X-ray source (F) configured to irradiate a sample (110) with an X-ray, the sample (110) being fixed on the sample stage (2); an X-ray detector (107) configured to detect the X-ray diffracted by the sample (110); and an opening/closing mechanism configured to vary a width of a slit, which is formed between a pair of shielding members (3), by opening/closing the pair of shielding members (3), the opening/closing mechanism including an asymmetric control unit (4) configured to control aperture widths of the pair of shielding members (3) asymmetrically for one of the pair of shielding members (3) on one side and another one of the pair of shielding members (3) on another side depending on a rotation angle (θ) of the goniometer (104).