METHOD OF MEASURING ABERRATION AND ELECTRON MICROSCOPE

A method of measuring an aberration in an electron microscope (100) includes: acquiring an image for measuring an aberration in the electron microscope (100); and measuring an aberration by using the image, and in measuring an aberration, a direction of defocusing is specified based on a residual ab...

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Bibliographische Detailangaben
Hauptverfasser: MORISHITA, Shigeyuki, UEMATSU, Fuminori, AIBARA, Keito, NAKAMICHI, Tomohiro, SAGAWA, Ryusuke
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A method of measuring an aberration in an electron microscope (100) includes: acquiring an image for measuring an aberration in the electron microscope (100); and measuring an aberration by using the image, and in measuring an aberration, a direction of defocusing is specified based on a residual aberration that is uniquely determined by a configuration of an optical system (20) of the electron microscope (100) and an optical condition of the optical system (20).