DEVICE FOR CLEANING A SURFACE IN THE INTERIOR OF AN OPTICAL SYSTEM

DEVICE FOR CLEANING A SURFACE IN THE INTERIOR OF AN OPTICAL SYSTEM

The present invention relates to a device for cleaning a surface (302, 402) in the interior of an optical system (300, 400), in particular of an EUV lithography system, comprising a rod-shaped element (303, 403), wherein the rod-shaped element comprises a visualization unit (304, 404) configured to...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: DIESCH, Jovana-Maria, SIGEL, Benjamin, PETASCH, Thomas
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:The present invention relates to a device for cleaning a surface (302, 402) in the interior of an optical system (300, 400), in particular of an EUV lithography system, comprising a rod-shaped element (303, 403), wherein the rod-shaped element comprises a visualization unit (304, 404) configured to visualize contaminates (320, 420) on the surface, and a cleaning unit (305, 405) configured to remove contaminates from the surface, and a distance sensor (306, 406), wherein the distance sensor is configured in such a way as to measure the distance between the surface and the end of the rod-shaped element, and a connection element (307, 407) configured in such a way that it can be secured at an opening (211, 311, 411) of the optical system, and wherein the connection element comprises a guide element (308, 408), with the aid of which the rod-shaped element (303, 403) can be guided. The invention further relates to the use of the device for cleaning a surface in the interior of an optical system, and to a method for cleaning in the interior of an optical system, in particular of a lithography system.