METHOD AND ARTICLE FOR METAL VAPOR INFILTRATION OF CMC PARTS

A method comprises discharging from a metal vaporization device a vapor of a metal or a metal precursor to a chemical vapor infiltration device where the chemical vapor infiltration device is in fluid communication with the metal vaporization device. The chemical vapor infiltration device contains a...

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Bibliographische Detailangaben
Hauptverfasser: Borkowski, Luke, Staroselsky, Alexander, She, Ying, Srinivasan, Gajawalli V
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:A method comprises discharging from a metal vaporization device a vapor of a metal or a metal precursor to a chemical vapor infiltration device where the chemical vapor infiltration device is in fluid communication with the metal vaporization device. The chemical vapor infiltration device contains a preform containing ceramic fibers. The preform is infiltrated with a metallic coating or a coating of a metallic precursor along with a ceramic precursor coating. The metallic coating and/or the metallic precursor coating and the ceramic precursor coating are applied sequentially or simultaneously.