IMPROVED STRUCTURE FOR RF SUBSTRATE AND MANUFACTURING METHOD
Producing a semiconductor or piezoelectric on-insulator type substrate for RF applications which is provided with a porous layer under the BOX layer and under a layer of polycrystalline semiconductor material.
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| creator | AUGENDRE, Emmanuel ROLLAND, Emmanuel REBOH, Shay ACOSTA ALBA, Pablo LORNE, Thomas |
| description | Producing a semiconductor or piezoelectric on-insulator type substrate for RF applications which is provided with a porous layer under the BOX layer and under a layer of polycrystalline semiconductor material. |
| format | Patent |
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| language | eng ; fre ; ger |
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| subjects | BASIC ELECTRIC ELEMENTS BASIC ELECTRONIC CIRCUITRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS RESONATORS SEMICONDUCTOR DEVICES |
| title | IMPROVED STRUCTURE FOR RF SUBSTRATE AND MANUFACTURING METHOD |
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