METHOD FOR THE MANUFACTURE OF SYNTHETIC QUARTZ GLASS

Described is a process for the production of synthetic fused silica in which the feedstock vapor is reacted from an organosilicon starting compound and any combustible burner auxiliary gases at an air number in the burner of less than or equal to 1.00. Furthermore, the present invention relates to a...

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Bibliographische Detailangaben
Hauptverfasser: Lehmann, Walter, Thürer, Martin, Trommer, Martin
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Described is a process for the production of synthetic fused silica in which the feedstock vapor is reacted from an organosilicon starting compound and any combustible burner auxiliary gases at an air number in the burner of less than or equal to 1.00. Furthermore, the present invention relates to a corresponding apparatus.