PROCESS FOR THE PREPARATION OF SYNTHETIC QUARTZ GLASS
Described is a process for the production of synthetic fused silica in which the deposition surface is located for a period of at least 50% of the build-up time of the soot body at a burner distance in which the horizontally integrated luminous intensity of the flame of the burner used in the target...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Described is a process for the production of synthetic fused silica in which the deposition surface is located for a period of at least 50% of the build-up time of the soot body at a burner distance in which the horizontally integrated luminous intensity of the flame of the burner used in the targetless state is still at least 2/3 of the maximum horizontally integrated luminous intensity of the flame. |
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