METHOD FOR OBTAINING FUNCTIONALIZED POLYMERIC SURFACES WITH PHOTOSENSITIZERS, FUNCTIONALIZED POLYMERIC MATERIAL AND USE THEREOF
The present invention describes methods for obtaining functionalized polymeric surfaces (MPn-PSm) from polymers or copolymers with appropriate functionalizations (X), which can be a halogen of a leaving group, such as polyvinyl chloride (MP1) and (chloromethyl)polystyrene-Merrifield (MP2), and curcu...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The present invention describes methods for obtaining functionalized polymeric surfaces (MPn-PSm) from polymers or copolymers with appropriate functionalizations (X), which can be a halogen of a leaving group, such as polyvinyl chloride (MP1) and (chloromethyl)polystyrene-Merrifield (MP2), and curcumin photosensitizers (PS1), meso-tetra(aryl)porphyrins, chlorins or bacteriochlorins halogenated and functionalized with nucleophilic groups (PS2), in particular including P2 of the type meso-imidazoyl-porphyrins, chlorins or bacteriochlorins (PS3). The structures of all the photosensitizers in the present application incorporate a functional group (Y), which is a OH, SH or NH 2nucleophile. The application also describes the covalent bonding process of the photosensitizers PS1-PS3 to the functional polymeric materials MP1-MP2 by means of a nucleophilic substitution reaction to prepare the MPn-Psm products. The formed products prevent microbial proliferation, which can cause the serious infections that are one of the main causes of death in patients using these devices. |
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