METHOD FOR CLEANING TIRE AND METHOD FOR MANUFACTURING TIRE

A cleaning method capable of reliably removing unnecessary deposits on a tire surface without damaging the rubber on the tire surface using plasma treatment and a method for manufacturing a tire to which this cleaning method is applied are provided.Irradiation conditions of plasma (P) in which rubbe...

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Bibliographische Detailangaben
Hauptverfasser: OKAMATSU Takahiro, SAIKI Takeaki
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A cleaning method capable of reliably removing unnecessary deposits on a tire surface without damaging the rubber on the tire surface using plasma treatment and a method for manufacturing a tire to which this cleaning method is applied are provided.Irradiation conditions of plasma (P) in which rubber in a predetermined range (11A) on a tire surface is not damaged by the irradiated plasma (P) are identified in advance. An irradiation head (3) held by an arm (5) and a tire (10) held by a rotation mechanism (7) are moved continuously or intermittently while controlling movement of at least one of them using a control device (6), the plasma (P) is irradiated from the irradiation head (3) to the predetermined range (11A) of an inner surface (11) of the tire (10) under the atmospheric pressure under the irradiation condition identified in advance, and unnecessary deposits (X) such as a release agent adhering to the predetermined range (11A) are removed.