EUV IN-SITU LINEARITY CALIBRATION FOR TDI IMAGE SENSORS USING TEST PHOTOMASKS

A photomask includes a plurality of distinctly patterned regions to provide different respective intensities of extreme ultraviolet (EUV) light in response to illumination with an EUV beam. The photomask may be part of a system that also includes a time-delay-integration (TDI) inspection tool with a...

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Bibliographische Detailangaben
Hauptverfasser:	SHI, Rui-Fang, KVAMME, Damon, HUANG, Haifeng
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC COMMUNICATION TECHNIQUE ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PICTORIAL COMMUNICATION, e.g. TELEVISION TESTING
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Beschreibung
Zusammenfassung:	A photomask includes a plurality of distinctly patterned regions to provide different respective intensities of extreme ultraviolet (EUV) light in response to illumination with an EUV beam. The photomask may be part of a system that also includes a time-delay-integration (TDI) inspection tool with an EUV light source and a TDI sensor. The EUV light source is to generate the EUV beam. The photomask is to be loaded into the TDI inspection tool. The system further includes a reference intensity detector to be mounted in the TDI inspection tool to measure intensities of EUV light collected from the photomask.