METHOD OF PERFORMING METROLOGY

Methods of performing metrology are disclosed. In one arrangement a substrate is provided that has a layer formed on the substrate. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with an incoherent beam of radiation and radiation redirected by the target...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SCOTUZZI, Marijke, FARAMARZI, Vina, KURGANOVA, Evgenia, VAN DEN BROEK, Bastiaan, Maurice
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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Beschreibung
Zusammenfassung:	Methods of performing metrology are disclosed. In one arrangement a substrate is provided that has a layer formed on the substrate. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with an incoherent beam of radiation and radiation redirected by the target portion of the layer is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.