MULTICELL OR MULTIARRAY PLASMA AND METHOD FOR SURFACE TREATMENT USING THE SAME

Plasma device (1) comprising at least two plasma cells (Cx), and a command unit (2), wherein the first (E1) and the second (E2) electrodes of a given plasma cell (Cx) are independent from the corresponding first and second electrodes of the contiguous plasma cells. The electrodes of contiguous plasm...

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Bibliographische Detailangaben
Hauptverfasser:	Bircher, Fritz, Martinet, David, Filliger, Sebastian, Gugler, Gilbert, Ellert, Christoph, Germanier, Alain
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Plasma device (1) comprising at least two plasma cells (Cx), and a command unit (2), wherein the first (E1) and the second (E2) electrodes of a given plasma cell (Cx) are independent from the corresponding first and second electrodes of the contiguous plasma cells. The electrodes of contiguous plasma cells are independently connected to the command unit. The command unit comprises a high voltage generator (21) and a radiofrequency generator (22) which are mutually protected by a filtering element (23).