APPARATUS FOR USE IN A METROLOGY PROCESS OR LITHOGRAPHIC PROCESS

The invention provides an apparatus for use in a metrology process or a lithographic process, the apparatus comprising: an object support module adapted to hold an object; a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a fi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	VAN GEND, Johan, PRIL, Wouter, Onno, GOSEN, Jeroen, Gerard, DE VOS, Youssef, Karel, Maria, VAN DE GROES, Henricus, Martinus, Johannes, VAN BANNING, Dennis, Herman, Caspar, ARORA, Sampann, RONDE, Michaël, Johannes, Christiaan, KUINDERSMA, Lucas, KEULEN, Luuc, KOOIKER, Allard, Eelco
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention provides an apparatus for use in a metrology process or a lithographic process, the apparatus comprising: an object support module adapted to hold an object; a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.