INSPECTION METHOD AND MANUFACTURING METHOD FOR STRUCTURE AND INSPECTION APPARATUS AND MANUFACTURING APPARATUS FOR STRUCTURE

It is possible to detect, with high accuracy, whether a structure is a good product or a defective product. This inspection apparatus for a structure comprises: X-ray emitting means (1a, 1b) for emitting X-rays through two or more paths; one or more X-ray detection means (3) for detecting the X-rays...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TANINO, Takahiro, SUGIHARA, Hiroki
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:It is possible to detect, with high accuracy, whether a structure is a good product or a defective product. This inspection apparatus for a structure comprises: X-ray emitting means (1a, 1b) for emitting X-rays through two or more paths; one or more X-ray detection means (3) for detecting the X-rays passing through the a structure (2); a multiple position distance measurement means (4) for measuring the distance from the X-ray emitting means to the structure at a plurality of positions; and an image processing means (5). The image processing means includes: a defective candidate detection means for detecting a defective candidate in two or more images acquired by the X-ray detection means; a height measurement means; an image calculation means for logically multiplying an image, on which height position information obtained by the height measurement means is recorded, by a defective candidate image obtained by the defective candidate detection means; an inspection range setting means for setting an inspection range from the distance and the thickness of the structure; and a defect determination means for determining that there is a defect when the inspection range includes the defective candidate.