OPTICAL STACK DEPOSITION AND ON-BOARD METROLOGY

OPTICAL STACK DEPOSITION AND ON-BOARD METROLOGY

A method and apparatus for forming an optical stack having uniform and accurate layers is provided. A processing tool used to form the optical stack comprises, within an enclosed environment, a first transfer chamber, an on-board metrology unit, and a second transfer chamber. A first plurality of pr...

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Bibliographische Detailangaben
Hauptverfasser: YANG, Zihao, PATIBANDLA, Nag B, DIEHL, Daniel, ZENG, Weimin, CAO, Yong, EGAN, Todd, BUDIARTO, Edward, GURUSAMY, Surender Kumar, ZHENG, Renjing, ZHU, Mingwei, KHASGIWALE, Niranjan R
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method and apparatus for forming an optical stack having uniform and accurate layers is provided. A processing tool used to form the optical stack comprises, within an enclosed environment, a first transfer chamber, an on-board metrology unit, and a second transfer chamber. A first plurality of processing chambers is coupled to the first transfer chamber or the second transfer chamber. The on-board metrology unit is disposed between the first transfer chamber and the second transfer chamber. The on-board metrology unit is configured to measure one or more optical properties of the individual layers of the optical stack without exposing the layers to an ambient environment.