WAFER CARRIER FOR METAL ORGANIC CHEMICAL VAPOR DEPOSITION

This application provides a wafer carrier for metal organic chemical vapor deposition. The wafer carrier includes at least one wafer sub-carrier that is in a groove structure and that is configured to place an epitaxial wafer substrate. A first space in the wafer sub-carrier is filled with a first t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WAN, Yuxi, PENG, Zetao
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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