SYNTHETIC QUARTZ GLASS SUBSTRATE WITH ANTIREFLECTION FILM, WINDOW MATERIAL, LID FOR OPTICAL ELEMENT PACKAGE, OPTICAL ELEMENT PACKAGE, AND LIGHT IRRADIATION DEVICE

SYNTHETIC QUARTZ GLASS SUBSTRATE WITH ANTIREFLECTION FILM, WINDOW MATERIAL, LID FOR OPTICAL ELEMENT PACKAGE, OPTICAL ELEMENT PACKAGE, AND LIGHT IRRADIATION DEVICE

A synthetic quartz glass substrate with an antireflection film, including a synthetic quartz glass substrate (100) and an antireflection film (140) formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the ma...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TAKEUCHI, Masaki, MATSUI, Harunobu, HARADA, Daijitsu
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Beschreibung
Zusammenfassung:A synthetic quartz glass substrate with an antireflection film, including a synthetic quartz glass substrate (100) and an antireflection film (140) formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the main surface of the synthetic quartz glass substrate is within 5 degrees, and the antireflection film includes a first layer (110) containing Al2O3, a second layer (120) containing HfO2, and a third layer (130) containing MgF2 or SiO2 sequentially laminated on the main surface of the synthetic quartz glass substrate.