METHOD AND APPARATUS FOR CONTROLLING THE TEMPERATURE OF A SEMICONDUCTOR WAFER

METHOD AND APPARATUS FOR CONTROLLING THE TEMPERATURE OF A SEMICONDUCTOR WAFER

A semiconductor wafer mass metrology method comprising: controlling the temperature of a semiconductor wafer by: detecting information relating to the temperature of the semiconductor wafer; and controlling cooling or heating of the semiconductor wafer based on the detected information relating to t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TONNIS, Eric, ELLIOTT, Gregor, BERRY, Mark, HARRISON, Paul
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
WEIGHING
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Beschreibung
Zusammenfassung:A semiconductor wafer mass metrology method comprising: controlling the temperature of a semiconductor wafer by: detecting information relating to the temperature of the semiconductor wafer; and controlling cooling or heating of the semiconductor wafer based on the detected information relating to the temperature of the semiconductor wafer; wherein controlling the cooling or heating of the semiconductor wafer comprises controlling a duration of the cooling or heating of the semiconductor wafer; and subsequently loading the semiconductor wafer onto a measurement area of a semiconductor wafer mass metrology apparatus.