DETECTION METHOD AND SYSTEM FOR PELLICLE MEMBRANE OF PHOTOMASK

A detection method for a pellicle membrane (123) of a photomask includes applying a predetermined pressure under which the pellicle membrane (123) undergoes a deformation, measuring and calculating at least one of deformation level, Young's modulus, and flexural rigidity level of the pellicle m...

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Bibliographische Detailangaben
1. Verfasser:	LEE, YUING
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A detection method for a pellicle membrane (123) of a photomask includes applying a predetermined pressure under which the pellicle membrane (123) undergoes a deformation, measuring and calculating at least one of deformation level, Young's modulus, and flexural rigidity level of the pellicle membrane (123) by detection, and obtaining a detection result about the pellicle membrane (123) according to at least one of the deformation level, Young's modulus, and flexural rigidity level of the pellicle membrane (123), so as to evaluate the quality of the pellicle membrane (123).