RAPID THERMAL CYCLING DEVICES

RAPID THERMAL CYCLING DEVICES

A rapid thermal cycling device can include a static microfluidic reaction chamber that can be defined between a layered substrate and a cover that can have an average space therebetween from 4 μm to 150 μm. The layered substrate can include a heating element thermally coupled to the static microflui...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: GOVYADINOV, Alexander, KORNILOVICH, Pavel
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PHYSICS
TESTING
TRANSPORTING
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Beschreibung
Zusammenfassung:A rapid thermal cycling device can include a static microfluidic reaction chamber that can be defined between a layered substrate and a cover that can have an average space therebetween from 4 μm to 150 μm. The layered substrate can include a heating element thermally coupled to the static microfluidic reaction chamber to heat a fluid when present therein. The layered substrate, the cover, or both can include a heat diffusing material thermally coupled to the static microfluidic reaction chamber to diffuse heat out from the fluid while remaining in the static microfluidic reaction chamber.