PROCESS, REACTOR AND SYSTEM FOR CUSTOMIZING AUTONOMOUS NANOSTRUCTURES USING MICROWAVE PLASMA
The invention relates to a process, reactor and system for the customization of autonomous nanostructures, using a microwave excited plasma environment sustained by surface waves (SW).Two distinct streams are injected into two distinct zones of a plasma reactor, the first stream (FS) being constitut...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The invention relates to a process, reactor and system for the customization of autonomous nanostructures, using a microwave excited plasma environment sustained by surface waves (SW).Two distinct streams are injected into two distinct zones of a plasma reactor, the first stream (FS) being constituted by carrier gases and by the nanostructures to customize and the second stream (SS) by a mixture of inert gases, at least one precursor of the dopant component (PDC) and/or at least one type of microparticles (MP). The FS is injected into part (7) of the reactor and the SS in part (6). The SS is exposed to the electric field of a surface wave excited by using microwave power, creating a hot plasma (8). The two streams join together in zones (4) and (5), where the nanostructures are customized through their interaction with the components coming from the SS. |
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