LAMINATE STRUCTURE AND METHOD FOR MANUFACTURING SAME, AND SEMICONDUCTOR DEVICE
[Problem]: The problem of the present invention is to provide a stacked structure excellent in stability of atomic arrangement, a method of manufacturing same, and a semiconductor device using the stacked structure. [Solution]: The stacked structure of the present invention is characterized in that...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | [Problem]: The problem of the present invention is to provide a stacked structure excellent in stability of atomic arrangement, a method of manufacturing same, and a semiconductor device using the stacked structure. [Solution]: The stacked structure of the present invention is characterized in that it has an alloy layer A having germanium and tellurium as a main component and an alloy layer B having tellurium and either of antimony or bismuth as a main component, and at least either of the alloy layer A or the alloy layer B contains at least either of sulfur or selenium as a chalcogen atom. |
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