VACUUM PUMP OR LINE AND METHOD FOR MONITORING A DEPOSITION OF BY-PRODUCTS

A vacuum apparatus (5) comprising a vacuum enclosure (17) having a circumferential surface and an inner surface to be placed under vacuum and further comprises at least one guided surface acoustic waves device (18) and a control unit (19) configured to control the piezo-electric transducers (20, 21)...

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Bibliographische Detailangaben
Hauptverfasser:	BIRKENFELD, Maximilian, WIELSCH, Pascal, KAMBARA, Hisanori
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	A vacuum apparatus (5) comprising a vacuum enclosure (17) having a circumferential surface and an inner surface to be placed under vacuum and further comprises at least one guided surface acoustic waves device (18) and a control unit (19) configured to control the piezo-electric transducers (20, 21) to monitor a variation of at least one parameter of a surface acoustic wave propagating along the circumferential surface of the vacuum enclosure (17) to detect by-products deposition (23) on the circumferential surface and/or to determine the properties of the by-product deposition (23).