POLYCRYSTALLINE SILICON ROD MANUFACTURING METHOD, AND REACTOR

[Problem] To develop a method for manufacturing a polycrystalline silicon rod using the Siemens process, wherein the jetting rate of a silicon deposition raw material gas from a gas supply nozzle is more greatly improved, thereby strengthening the force of the gas flow and achieving superior raw mat...

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Bibliographische Detailangaben
Hauptverfasser:	AIMOTO, Yasumasa, TATSUKAWA, Takafumi
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	[Problem] To develop a method for manufacturing a polycrystalline silicon rod using the Siemens process, wherein the jetting rate of a silicon deposition raw material gas from a gas supply nozzle is more greatly improved, thereby strengthening the force of the gas flow and achieving superior raw material gas circulation in an upper section and a lower section within a bell jar. [Solution] In a reactor for manufacturing a polycrystalline silicon rod, the polycrystalline silicon rod is manufactured by using, as at least one gas supply nozzle, a flow rate amplification nozzle provided with a function of amplifying the flow rate of the silicon deposition raw material gas supplied to the nozzle and jetting the gas.