SYSTEM FOR TREATING A METAL SUBSTRATE

Disclosed is a system for treating a substrate surface. The system includes a conditioner composition and a first pretreatment composition. The conditioner composition comprises a hydroxide source and the first pretreatment composition comprises a magnesium element, a halide element, and an oxidizin...

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Bibliographische Detailangaben
Hauptverfasser:	O'NEIL, Kevin A, RAKIEWICZ, Edward F, POST, Gordon L, MAYO, Michael A
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Disclosed is a system for treating a substrate surface. The system includes a conditioner composition and a first pretreatment composition. The conditioner composition comprises a hydroxide source and the first pretreatment composition comprises a magnesium element, a halide element, and an oxidizing agent. Methods of treating a substrate surface using the conditioner composition and the first pretreatment composition also are disclosed. Also disclosed are substrates treated with the system and method.