GAS SUPPLY DEVICE AND LASER PROCESSING HEAD COMPRISING SAME
The invention relates to a laser processing system (1000). The laser processing system (1000) comprises a laser device for generating a laser beam (10), a gas supply device for generating a gas flow, and a common volume (120) in which the laser beam (10) and the gas flow are overlapped. The gas supp...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The invention relates to a laser processing system (1000). The laser processing system (1000) comprises a laser device for generating a laser beam (10), a gas supply device for generating a gas flow, and a common volume (120) in which the laser beam (10) and the gas flow are overlapped. The gas supply device comprises at least one storage chamber (112) having a gas inlet (114), and at least one throttle element (116, 416, 516) that connects the storage chamber (112) to the common volume (120), wherein the at least one storage chamber (112) and the at least one throttle element (116, 416, 516) are designed to provide a substantially homogeneous gas supply to the common volume (120). |
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